Semiconductor Equipment
Produce by LPCVD System and Class 10 Oven
LPCVD System
- Temperature range: 205~1200℃
- Wafer size: 2”~8” Wafer
- Pressure: 1~100Torr
- 3 Zone program control
- Fully automatic PC control
- Vacuum: 10 Torr
- Power: 380V / 160A / 60Hz / 3ph
Class 10 Oven
- Cleanliness: Class 10
- Temperature Range: up to 250℃
- Uniformity : ±1℃
- Control Accurancy : ±5℃
- Resolution : ±0.1℃
